Dr. Francesca Campabadal

Research Professor
Institut de Microelectrònica de Barcelona (IMB-CNM)
Consejo Superior de Investigaciones Científicas (CSIC)

Francesca Campabadal graduated in Physics in 1981 and obtained the Ph.D. degree in 1986, both from the Universitat Autònoma de Barcelona. She joined the Institut de Microelectrònica de Barcelona of the CSIC in 1987, where she has been involved in the design and development of silicon-based technologies for electronic devices and sensors, and in the study of the electrical characteristics of thin films of dielectric materials.

At present, she coordinates the Advanced Thin Dielectric Films (ATDF) group at IMB-CNM, a research group that started its activities in 2008 with focus on thin high-k dielectrics films for silicon-based micro and nanoelectronic devices.

Research interests:

  • ALD technique for high-k dielectric films deposition.
  • Electrical characteristics of thin dielectric films in silicon-based devices
  • Resistive switching devices fabrication and characterization.
  • Radiation-induced effects on materials and devices.

http://orcid.org/0000-0001-7758-4567
Scopus Author ID: 7004481916
Researcher ID: E-6651-2014


+ Contact

Institut de Microelectrònica de Barcelona (IMB-CNM)
Carrer dels Til·lers, s/n
Campus UAB 08193 Bellaterra Spain
E-mail: Francesca.campabadal [at] csic [dot] es
Phone: +34 93 594 7700

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